Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating
نویسندگان
چکیده
منابع مشابه
Recent Advances in Multivariate Statistical Process Control: Improving Robustness and Sensitivity
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ژورنال
عنوان ژورنال: IFAC Proceedings Volumes
سال: 1997
ISSN: 1474-6670
DOI: 10.1016/s1474-6670(17)43143-0